MATEK offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for your particular applications. A number of metallurgical techniques are employed in PVD material fabrication.

Manufacturing Technologies :

· Vacuum Hot Pressing (VHP)

· Hot Isostatic Pressing (HIP)

· Cold Isostatic Pressing (CIP)

· Vacuum Sintering

· Vacuum Induction Melting (VIM)

· Vacuum Electromagnetic Levitation Melting & Casting

· Vacuum Arc Melting (VAR)

· Electron-Beam Melting

· Plasma Spraying/Vacuum Plasma Spraying

· Forging/Rolling/Annealing

Sputtering Target Properties :

> High Purity, High Density

> Fine and Homogenous Grained Microstructure

> Good Electrical Properties for Ceramic Sputtering Target

> Optimized for OEM Sputter Tool

All the sputtering materials are manufactured to wide range of size and shapes(Planar and Rotatable) according to customer sputtering magnetron system requirement. MATEK will jointly develops with customer to optimize the target utilization in order to achieve the lowest cost of ownership. In developing the sputtering target, the following requirements must be considered to achieve optimum properties:

> Functional Properties in relation to the selected materials.

> High Purity Materials

> High Density

> Low or Controlled Gas Content

> Homogeneous Materials

> Fine Grain Size

> Crystallographic Texture

> Magnetic Properties

> Thermally Conductive

> Mechanically Stable throughout the Sputtering Process